2nd International Workshop on Pattern Recognition (IWPR 2017)

The 2nd International Workshop on Pattern Recognition (IWPR 2017) will be held in Singapore on May 1–3, 2017.


Topics of interest include:

Computer vision

  • 2D/3D object detection and recognition
  • Occlusion and shadow detection
  • Vision for robotics
  • Scene understanding

Image processing

  • Segmentation, features and descriptors
  • Texture and color analysis
  • Enhancement, restoration and filtering
  • Coding and compression

Document analysis, biometrics and applications

  • Character and text recognition
  • Facial expression recognition
  • Gesture and behavior analysis
  • Human-computer interaction

Biomedical image analysis

  • Medical and biological imaging
  • Segmentation of medical images
  • Volumetric image analysis
  • Medical robotics

See full list on the official website.

Most important dates

  • Submission deadline: November 10, 2016
  • Notification of acceptance: December 1, 2016
  • Starting date: May 1, 2017
  • End date: May 3, 2017

Contact information


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